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    Double patterning layout decomposition for simultaneous conflict and stitch minimization

    14 years 7 months ago
    Double patterning layout decomposition for simultaneous conflict and stitch minimization
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    Kun Yuan, Jae-Seok Yang, David Z. Pan
    claim paper
    Added 19 May 2010
    Updated 19 May 2010
    Type Conference
    Year 2009
    Where ISPD
    Authors Kun Yuan, Jae-Seok Yang, David Z. Pan
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