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DAC
2000
ACM
14 years 2 months ago
2000
ACM
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
CAV
2000
Springer
14 years 2 months ago
2000
Springer
Abstract. Any formalmethodor tool is almostcertainlymoreoftenapplied in situationswheretheoutcomeis failure(acounterexample)rather than success (a correctness proof). We present a ...
CP
1999
Springer
14 years 2 months ago
1999
Springer
The behaviour of many systems is naturally modelled by a set of ordinary differential equations (ODEs) which are parametric. Since decisions are often based on relations over these...
VISUALIZATION
1999
IEEE
14 years 2 months ago
1999
IEEE
With the development of magnetic resonance imaging techniques for acquiring diffusion tensor data from biological tissue, visualization of tensor data has become a new research fo...
ICCAD
1998
IEEE
14 years 2 months ago
1998
IEEE
This paper considers simultaneous gate and wire sizing for general very large scale integrated (VLSI) circuits under the Elmore delay model. We present a fast and exact algorithm w...