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ISPD
2010
ACM
14 years 3 months ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
WETICE
1998
IEEE
14 years 15 days ago
1998
IEEE
Although work pr ocesses, like software pr ocesses, include a number of process aspects such as defined phases and deadlines, they are not plannable in detail. Howe ver, the advan...
ACL
1996
13 years 9 months ago
1996
We present a natural language interface system which is based entirely on trained statistical models. The system consists of three stages of processing: parsing, semantic interpre...
CODES
2006
IEEE
14 years 2 months ago
2006
IEEE
Modern embedded systems for image processing involve increasingly complex levels of functionality under real-time and resourcerelated constraints. As this complexity increases, th...
TMRA
2005
Springer
14 years 1 months ago
2005
Springer
This work-in-progress report subsumes our ongoing research to develop a Topic Maps centric, modularised system which supports collaborative software development by combining the me...