Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
Although work pr ocesses, like software pr ocesses, include a number of process aspects such as defined phases and deadlines, they are not plannable in detail. Howe ver, the advan...
We present a natural language interface system which is based entirely on trained statistical models. The system consists of three stages of processing: parsing, semantic interpre...
Scott Miller, David Stallard, Robert J. Bobrow, Ri...
Modern embedded systems for image processing involve increasingly complex levels of functionality under real-time and resourcerelated constraints. As this complexity increases, th...
This work-in-progress report subsumes our ongoing research to develop a Topic Maps centric, modularised system which supports collaborative software development by combining the me...