Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
: Currently, many models are used to capture functional software requirements. However, the Software Engineering community has faded interaction requirements into the background, d...
The design of large dependable multiprocessor systems requires quick and precise mechanisms for detecting the faulty nodes. The problem of system-level fault diagnosis is computati...
—In this paper, we present a new sketch-based system — KnitSketch, to improve the efficiency of process planning for knitting garments at an early design stage. The KnitSketch...
Speaker clustering is the task of grouping a set of speech utterances into speaker-specific classes. The basic techniques for solving this task are similar to those used for spea...