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ISPD
2010
ACM
14 years 3 months ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
JUCS
2008
13 years 8 months ago
2008
: Currently, many models are used to capture functional software requirements. However, the Software Engineering community has faded interaction requirements into the background, d...
JNW
2006
13 years 8 months ago
2006
The design of large dependable multiprocessor systems requires quick and precise mechanisms for detecting the faulty nodes. The problem of system-level fault diagnosis is computati...
TASE
2011
IEEE
13 years 3 months ago
2011
IEEE
—In this paper, we present a new sketch-based system — KnitSketch, to improve the efficiency of process planning for knitting garments at an early design stage. The KnitSketch...
MM
2009
ACM
14 years 3 months ago
2009
ACM
Speaker clustering is the task of grouping a set of speech utterances into speaker-specific classes. The basic techniques for solving this task are similar to those used for spea...