152 search results - page 4 / 31 » A Practical Agent-Based Approach for Pattern Layout Design |
TVLSI
2010
13 years 2 months ago
2010
The gap between VLSI technology and fabrication technology leads to strong refractive effects in lithography. Consequently, it is a huge challenge to reliably print layout features...
CEC
2007
IEEE
14 years 1 months ago
2007
IEEE
— In this paper we present a new algorithm for the Layout Optimization Problem: this concerns the placement of circular, weighted objects inside a circular container, the two obj...
ICS
2005
Tsinghua U.
14 years 27 days ago
2005
Tsinghua U.
Excessive power consumption is becoming a major barrier to extracting the maximum performance from high-performance parallel systems. Therefore, techniques oriented towards reduci...
CGO
2004
IEEE
13 years 11 months ago
2004
IEEE
In this paper, we describe a generalized approach to deriving a custom data layout in multiple memory banks for array-based computations, to facilitate high-bandwidth parallel mem...
ISPD
2007
ACM
13 years 9 months ago
2007
ACM
When VLSI technology scales toward 45nm, the lithography wavelength stays at 193nm. This large gap results in strong refractive effects in lithography. Consequently, it is a huge...