Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
Handwritten document images contain textlines with multi orientations, touching and overlapping characters within consecutive textlines, and small inter-line spacing making textli...
Syed Saqib Bukhari, Faisal Shafait, Thomas M. Breu...
Graph cuts based interactive segmentation has become very popular over the last decade. In standard graph cuts, the extraction of foreground object in a complex background often le...
— For a mobile robot that interacts with humans such as a home assistant or a tour guide robot, tracking a particular person among multiple persons is a fundamental, yet challeng...
Abstract In this paper, we study the problem of approximate topological matching for quadrilateral meshes, that is, the problem of finding as large a set as possible of matching p...
David Eppstein, Michael T. Goodrich, Ethan Kim, Ra...