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ISQED
2010
IEEE
14 years 3 months ago
2010
IEEE
—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
BMVC
2010
13 years 6 months ago
2010
The paper proposes a new method to perform foreground detection by means of background modeling using the tensor concept. Sometimes, statistical modelling directly on image values...
IJCNN
2006
IEEE
14 years 2 months ago
2006
IEEE
Abstract— We present a method for exploratory data analysis of large spatiotemporal data sets such as global longtime climate measurements, extending our previous work on semibli...
ICML
2003
IEEE
14 years 9 months ago
2003
IEEE
We show a close relationship between the Expectation - Maximization (EM) algorithm and direct optimization algorithms such as gradientbased methods for parameter learning. We iden...
IDA
2007
Springer
14 years 2 months ago
2007
Springer
Abstract. Microarrays allow biologists to determine the gene expressions for tens of thousands of genes simultaneously, however due to biological processes, the resulting microarra...