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TCAD
2010
88views more  TCAD 2010»
13 years 2 months ago
Stress Aware Layout Optimization Leveraging Active Area Dependent Mobility Enhancement
Starting from the 90nm technology node, process induced stress has played a key role in the design of highperformance devices. The emergence of source/drain silicon germanium (S/D ...
Ashutosh Chakraborty, Sean X. Shi, David Z. Pan
TCAD
2010
194views more  TCAD 2010»
13 years 2 months ago
Layout Decomposition Approaches for Double Patterning Lithography
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
TVCG
2010
151views more  TVCG 2010»
13 years 2 months ago
Interactive Visual Analysis of Multiple Simulation Runs Using the Simulation Model View: Understanding and Tuning of an Electron
Multiple simulation runs using the same simulation model with different values of control parameters usually generate large data sets that capture the variational aspects of the be...
Kresimir Matkovic, Denis Gracanin, Mario Jelovic, ...
ESWA
2011
220views Database» more  ESWA 2011»
12 years 11 months ago
Unsupervised neural models for country and political risk analysis
This interdisciplinary research project focuses on relevant applications of Knowledge Discovery and Artificial Neural Networks in order to identify and analyse levels of country, b...
Álvaro Herrero, Emilio Corchado, Alfredo Ji...
IRFC
2011
Springer
12 years 11 months ago
Applying Web Usage Mining for Adaptive Intranet Navigation
Much progress has recently been made in assisting a user in the search process, be it Web search where the big search engines have now all incorporated more interactive features or...
Sharhida Zawani Saad, Udo Kruschwitz
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