Starting from the 90nm technology node, process induced stress has played a key role in the design of highperformance devices. The emergence of source/drain silicon germanium (S/D ...
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
Multiple simulation runs using the same simulation model with different values of control parameters usually generate large data sets that capture the variational aspects of the be...
Kresimir Matkovic, Denis Gracanin, Mario Jelovic, ...
This interdisciplinary research project focuses on relevant applications of Knowledge Discovery and Artificial Neural Networks in order to identify and analyse levels of country, b...
Much progress has recently been made in assisting a user in the search process, be it Web search where the big search engines have now all incorporated more interactive features or...