Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
We show that it is equivalent, for certain sets of finite graphs, to be definable in CMS (counting monadic second-order, a natural extension of monoadic second-order logic), and t...
Vector field analysis plays a crucial role in many engineering applications, such as weather prediction, tsunami and hurricane study, and airplane and automotive design. Existing ...
Guoning Chen, Konstantin Mischaikow, Robert S. Lar...
Industry is moving towards multi-core designs as we have hit the memory and power walls. Multi-core designs are very effective to exploit thread-level parallelism (TLP) but do not...
Many instances of NP-hard problems can be solved efficiently if the treewidth of their corresponding graph is small. Finding the optimal tree decompositions is an NP-hard problem a...