113 search results - page 10 / 23 » Biased Cost Pathfinding |
ACISICIS
2008
IEEE
14 years 3 months ago
2008
IEEE
Dedicated machine constraint is one of the new challenges introduced in photolithography machinery of the semiconductor manufacturing system due to natural bias. Previous research...
ICPR
2008
IEEE
14 years 3 months ago
2008
IEEE
We propose Genetic Algorithms to improve the feature subset selection by combining the valuable outcomes from multiple feature selection methods. This paper also motivates the use...
ICTAI
2008
IEEE
14 years 3 months ago
2008
IEEE
We propose an Integer Programming (IP) framework to undertake the dedicated photolithography machine constraint in semiconductor manufacturing. The constraint is one of the new ch...
HICSS
2006
IEEE
14 years 3 months ago
2006
IEEE
In highly globalized industries such as the automotive industry, product development is strongly dependent on e-collaboration tools that hold the potential to capitalize on specia...
IOLTS
2005
IEEE
14 years 2 months ago
2005
IEEE
With the aggressive scaling of the CMOS technology parametric variation of the transistor threshold voltage causes significant spread in the circuit delay as well as leakage spect...