Ever-growing complexity is forcing design to move above RTL. For example, golden functional models are being written as clearly as possible in software and not optimized or intend...
Antenna effect may damage gate oxides during plasma-based fabrication process. The antenna ratio of total exposed antenna area to total gate oxide area is directly related to the ...
In this paper, we present a clustering based algorithm for acyclic multi-way partitioning. Many existing partitioning algorithms have shown that clustering can effectively improv...
Eric S. H. Wong, Evangeline F. Y. Young, Wai-Kei M...
Evaluating and comparing the quality of surface interpolants is an important problem in computer graphics, computer aided geometric design and scienti c visualization. We introduc...
Suresh K. Lodha, Robert E. Sheehan, Alex Pang, Cra...
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...