424 search results - page 20 / 85 » Delay modelling improvement for low voltage applications |
ISVLSI
2007
IEEE
14 years 2 months ago
2007
IEEE
As technology scales, more sophisticated fabrication processes cause variations in many different parameters in the device. These variations could severely affect the performance ...
GLVLSI
2007
IEEE
14 years 2 months ago
2007
IEEE
Parallel counters are key elements in many arithmetic circuits, especially fast multipliers. In this paper, novel architectures and designs for high speed, low power (3, 2), (7, 3...
ICCSA
2004
Springer
14 years 1 months ago
2004
Springer
The end-to-end characteristic is an important factor for QoS support. Since network users and their required bandwidths for applications increase, the efficient usage of networks h...
ICPP
2008
IEEE
14 years 2 months ago
2008
IEEE
A rising horizon in chip fabrication is the 3D integration technology. It stacks two or more dies vertically with a dense, high-speed interface to increase the device density and ...
DATE
2010
IEEE
14 years 1 months ago
2010
IEEE
With aggressive gate oxide scaling, latent defects in the gate oxide manifest as traps that, in time, lead to gate oxide breakdown. Progressive gate oxide breakdown, also referred...