Many research studies adopt manually selected patterns for semantic relation extraction. However, manually identifying and discovering patterns is time consuming and it is difficu...
Wenbo Wang, Christopher Thomas, Amit P. Sheth, Vic...
In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...
Double patterning lithography seems to be a prominent choice for 32nm and 22nm technologies. Double patterning lithography techniques require additional masks for a single interco...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
In this paper, we originally propose a multiscale feature extraction method of finger-vein patterns based on curvelets and local interconnection structure neural networks. The cur...
We present a novel method to efficiently generate, compress and apply test patterns in a logic BIST architecture. Patterns are generated by a modified automatic test pattern gener...
Peter Wohl, John A. Waicukauski, Sanjay Patel, Min...