As the IC process technology scales, the oxide thickness and operating voltage continues to decrease. The gate oxide thickness in recent and future IC process technology has appro...
One of the fundamental problems in Deep Sub Micron (DSM) circuits is Simultaneous Switching Noise (SSN), which causes voltage fluctuations in the circuit power/ground networks. In...
— With advanced VLSI manufacturing technology in deep submicron (DSM) regime, we can integrate entire electronic systems on a single chip (SoC). Due to the complexity in SoC desi...
In this paper we report the fully depleted CMOS/SOI device design guidelines for low power applications. Optimal technology, device and circuit parameters are discussed and compar...
Srinivasa R. Banna, Philip C. H. Chan, Mansun Chan...