136 search results - page 15 / 28 » Error Metrics for Business Process Models |
DAC
2006
ACM
14 years 10 months ago
2006
ACM
Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional ...
CORR
2010
Springer
13 years 9 months ago
2010
Springer
Abstract. Software engineering activities in the Industry has come a long way with various improvements brought in various stages of the software development life cycle. The comple...
PG
1999
IEEE
14 years 1 months ago
1999
IEEE
In this paper we introduce a mesh approximation method that uses a volume-based metric. After a geometric simplification, we minimize the volume between the simplified mesh and th...
SPLC
2000
13 years 10 months ago
2000
: We consider a set of programs a family when it pays to look at their common aspects before looking at their differences. For commercial software developers the implications are t...
BMCBI
2006
13 years 9 months ago
2006
Background: High-density microarray technology is increasingly applied to study gene expression levels on a large scale. Microarray experiments rely on several critical steps that...