—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
For its high overall cost during product development, program debugging is an important aspect of system development. Debugging is a hard and complex activity, especially in time-...
Scientific workflow tools allow users to specify complex computational experiments and provide a good framework for robust science and engineering. Workflows consist of pipelines ...
David Abramson, Blair Bethwaite, Colin Enticott, S...
r of high-level languages lies in their abstraction over hardware and software complexity, leading to greater security, better reliability, and lower development costs. However, o...
Daniel Frampton, Stephen M. Blackburn, Perry Cheng...
In this paper, we rigorously analyse how the magnitude and frequency of change may affect the performance of the algorithm (1+1) EAdyn on a set of artificially designed pseudo-Bo...