The ability to account for the growing impacts of multiple process variations in modern technologies is becoming an integral part of nanometer VLSI design. Under the context of ti...
Aggressive technology scaling into the nanometer regime has led to a host of reliability challenges in the last several years. Unlike onchip caches, which can be efficiently prot...
Amin Ansari, Shuguang Feng, Shantanu Gupta, Scott ...
As technology advances into the nanometer territory, the interconnect delay has become a first-order effect on chip performance. To handle this effect, the X-architecture has been...
Abstract— Design variability due to within-die and die-todie process variations has the potential to significantly reduce the maximum operating frequency and the effective yield...
As transistor process technology approaches the nanometer scale, process variation significantly affects the design and optimization of high performance microprocessors. Prior stu...