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» Future Performance Challenges in Nanometer Design
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DAC
2007
ACM
14 years 8 months ago
Fast Second-Order Statistical Static Timing Analysis Using Parameter Dimension Reduction
The ability to account for the growing impacts of multiple process variations in modern technologies is becoming an integral part of nanometer VLSI design. Under the context of ti...
Zhuo Feng, Peng Li, Yaping Zhan
ISCA
2010
IEEE
340views Hardware» more  ISCA 2010»
14 years 15 days ago
Necromancer: enhancing system throughput by animating dead cores
Aggressive technology scaling into the nanometer regime has led to a host of reliability challenges in the last several years. Unlike onchip caches, which can be efficiently prot...
Amin Ansari, Shuguang Feng, Shantanu Gupta, Scott ...
DAC
2005
ACM
14 years 8 months ago
Multilevel full-chip routing for the X-based architecture
As technology advances into the nanometer territory, the interconnect delay has become a first-order effect on chip performance. To handle this effect, the X-architecture has been...
Tsung-Yi Ho, Chen-Feng Chang, Yao-Wen Chang, Sao-J...
ICCAD
2006
IEEE
169views Hardware» more  ICCAD 2006»
14 years 4 months ago
Microarchitecture parameter selection to optimize system performance under process variation
Abstract— Design variability due to within-die and die-todie process variations has the potential to significantly reduce the maximum operating frequency and the effective yield...
Xiaoyao Liang, David Brooks
HPCA
2009
IEEE
14 years 2 months ago
Soft error vulnerability aware process variation mitigation
As transistor process technology approaches the nanometer scale, process variation significantly affects the design and optimization of high performance microprocessors. Prior stu...
Xin Fu, Tao Li, José A. B. Fortes