455 search results - page 27 / 91 » Improved Force-Directed Layouts |
ICPP
1998
IEEE
14 years 2 months ago
1998
IEEE
We address the problems of I/O scheduling and buffer management for general reference strings in a parallel I/O system. Using the standard parallel disk model withD disks and a sh...
ICCAD
2006
IEEE
14 years 6 months ago
2006
IEEE
Yield and variability are becoming detractors for successful design in sub-90-nm process technologies. We consider the fundamental lithography and process issues that are driving ...
AIIDE
2009
13 years 11 months ago
2009
Design of game worlds is becoming more and more laborintensive because of the increasing demand and complexity of content. This is being partially addressed by developing semi-aut...
FPGA
2006
ACM
14 years 1 months ago
2006
ACM
Many System-on-a-Chip devices would benefit from the inclusion of reprogrammable logic on the silicon die, as it can add general computing ability, provide run-time reconfigurabil...
ICCAD
2008
IEEE
14 years 6 months ago
2008
IEEE
— Double patterning technology (DPT) is a most likely lithography solution for 32/22nm technology nodes as of 2008 due to the delay of Extreme Ultra Violet lithography. However, ...