Double patterning lithography seems to be a prominent choice for 32nm and 22nm technologies. Double patterning lithography techniques require additional masks for a single interco...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
As Double Patterning Lithography(DPL) becomes the leading candidate for sub-30nm lithography process, we need a fast and lithography friendly decomposition framework. In this pape...
Jae-Seok Yang, Katrina Lu, Minsik Cho, Kun Yuan, D...
In this paper we examine a latency insensitive network composed of very fast and simple circuits that connects SoC cores that are also latency insensitive, de-synchronized, or asy...
Daniel Gebhardt, JunBok You, W. Scott Lee, Kenneth...