In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...
Multihop wireless mesh networks can provide Internet access over a wide area with minimal infrastructure expenditure. In this work, we present a measurement driven deployment stra...
Joseph Camp, Joshua Robinson, Christopher Steger, ...
Distributed real-time automotive embedded systems have to be highly dependable as well as cost-efficient due to the large number of manufactured units. To close the gap between r...
Dietmar Schreiner, Markus Schordan, Karl M. Gö...
Future multicore processors will be more susceptible to a variety of hardware failures. In particular, intermittent faults, caused in part by manufacturing, thermal, and voltage v...
Philip M. Wells, Koushik Chakraborty, Gurindar S. ...
—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...