- In this paper, we study the wire sizing and wire spacing problem for post-layout performance optimization under Elmore delay model. Both ground capacitance and coupled capacitanc...
Ensuring the uniqueness of trademark images and protecting their identities are the most important objectives for the trademark registration process. To prevent trademark infringe...
Reinier H. van Leuken, M. Fatih Demirci, Victoria ...
Techniques for drawing graphs have proven successful in producing good layouts of undirected graphs. When nodes must be labeled however, the problem of overlapping nodes arises, p...
Xiaodi Huang, Wei Lai, A. S. M. Sajeev, Junbin Gao
In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different exposures)...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
: To facilitate research in comparative genomics, sequencing projects are increasingly aimed at assembling the genomes of closely related organisms. Given two incomplete assemblies...
Olaf Delgado Friedrichs, Aaron L. Halpern, Ross Li...