Abstract--To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous res...
Chunyang Feng, Hai Zhou, Changhao Yan, Jun Tao, Xu...
- To minimize energy consumption by voltage scaling in design of heterogeneousreal-time embeddedsystems, it is necessary to perfom two distinct tasks: task scheduling (TS) and volt...
Bita Gorjiara, Pai H. Chou, Nader Bagherzadeh, Meh...
ADAPTAPlan project provides dynamic assistance for reducing authors' effort in developing instructional design tasks using user modelling, planning and machine learning techn...
Silvia Baldiris, Olga C. Santos, Carmen Barrera, J...
In this paper, we present a long term learning system for content based image retrieval over a network. Relevant feedback is used among different sessions to learn both the simila...
Parallel computing is becoming increasing central and mainstream, driven both by the widespread availability of commodity SMP and high-performance cluster platforms, as well as th...