479 search results - page 38 / 96 » Learning to Improve both Efficiency and Quality of Planning |
DAC
2009
ACM
14 years 9 months ago
2009
ACM
Abstract--To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous res...
ASPDAC
2004
ACM
14 years 2 months ago
2004
ACM
- To minimize energy consumption by voltage scaling in design of heterogeneousreal-time embeddedsystems, it is necessary to perfom two distinct tasks: task scheduling (TS) and volt...
IJCSA
2008
13 years 8 months ago
2008
ADAPTAPlan project provides dynamic assistance for reducing authors' effort in developing instructional design tasks using user modelling, planning and machine learning techn...
ICIP
2008
IEEE
14 years 10 months ago
2008
IEEE
In this paper, we present a long term learning system for content based image retrieval over a network. Relevant feedback is used among different sessions to learn both the simila...
IPPS
1999
IEEE
14 years 1 months ago
1999
IEEE
Parallel computing is becoming increasing central and mainstream, driven both by the widespread availability of commodity SMP and high-performance cluster platforms, as well as th...