57 search results - page 5 / 12 » Local Color Correction Using Non-Linear Masking |
ICCS
2004
Springer
14 years 1 months ago
2004
Springer
A new Bayer pattern demosaicking scheme for single-sensor digital cameras is introduced. The raw output from a sensor, mostly a charge coupled device (CCD) or a complementary metal...
ICCAD
2009
IEEE
13 years 5 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
ICRA
2000
IEEE
14 years 14 hour ago
2000
IEEE
This paper presents a new appearance-based place recognition system for topological localization. The method uses a panoramic vision system to sense the environment. Color images ...
ECOOP
2008
Springer
13 years 8 months ago
2008
Springer
Shared mutable objects pose grave challenges in reasoning, especially for data abstraction and modularity. This paper presents a novel logic for erroravoiding partial correctness o...
MVA
1994
13 years 9 months ago
1994
A region-based matching approach is proposed for image correspondence of two images of the same scene but taken from different viewpoints. This approach consists of a matching sta...