Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
Reachability and shortest path problems are NL-complete for general graphs. They are known to be in L for graphs of tree-width 2 [14]. However, for graphs of treewidth larger than ...
We consider the following problem known as simultaneous geometric graph embedding (SGE). Given a set of planar graphs on a shared vertex set, decide whether the vertices can be pla...
Alejandro Estrella-Balderrama, Elisabeth Gassner, ...
The Minimum Weight Euclidean Matching (MWEM) problem is: given 2n point sites in the plane with Euclidean metric for interpoint distances, match the sites into n pairs so that the...
Our aim in this paper is to develop a Bayesian framework for matching hierarchical relational models. Such models are widespread in computer vision. The framework that we adopt fo...