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DAC
2006
ACM
14 years 8 months ago
Process variation aware OPC with variational lithography modeling
Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional ...
Peng Yu, Sean X. Shi, David Z. Pan
ICCV
2007
IEEE
14 years 1 months ago
Two-View Motion Segmentation by Mixtures of Dirichlet Process with Model Selection and Outlier Removal
This paper presents a novel motion segmentation algorithm on the basis of mixture of Dirichlet process (MDP) models, a kind of nonparametric Bayesian framework. In contrast to pre...
Yong-Dian Jian, Chu-Song Chen
ACL
2006
13 years 9 months ago
A Pipeline Framework for Dependency Parsing
Pipeline computation, in which a task is decomposed into several stages that are solved sequentially, is a common computational strategy in natural language processing. The key pr...
Ming-Wei Chang, Quang Do, Dan Roth
EDOC
2006
IEEE
13 years 11 months ago
A conceptual framework for service modelling
This paper presents a conceptual framework for service modelling and refinement, called the COSMO (COnceptual Service MOdelling) framework. This framework provides concepts to mode...
Dick A. C. Quartel, Maarten W. A. Steen, Stanislav...
CVPR
2010
IEEE
13 years 9 months ago
Modeling Pixel Process with Scale Invariant Local Patterns for Background Subtraction in Complex Scenes
Background modeling plays an important role in video surveillance, yet in complex scenes it is still a challenging problem. Among many difficulties, problems caused by illuminatio...
Shengcai Liao, Guoying Zhao, Vili Kellokumpu, Matt...