2984 search results - page 112 / 597 » Method engineering process patterns |
ICCAD
2008
IEEE
14 years 4 months ago
2008
IEEE
In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different exposures)...
ICPIA
1992
13 years 12 months ago
1992
:: This talk deals with fundamental aspects of Intelligent Pattern Recognition (IPR) and applications. It basically includes the following: Overview of 3D Biometric Technology and ...
AES
2007
Springer
13 years 8 months ago
2007
Springer
Pattern recognition is an important aspect of a dominant technology such as machine intelligence. Domain specific fuzzy-neuro models particularly for the ‘black box’ implemen...
INFOCOM
2009
IEEE
14 years 2 months ago
2009
IEEE
Abstract—Accelerating multi-pattern matching is a critical issue in building high-performance deep packet inspection systems. Achieving high-throughputs while reducing both memor...
IDEAL
2005
Springer
14 years 1 months ago
2005
Springer
The design, development, and use of complex systems models raises a unique class of challenges and potential pitfalls, many of which are commonly recurring problems. Over time, res...