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ISPD
2010
ACM
14 years 3 months ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
SDM
2008
SIAM
13 years 9 months ago
2008
SIAM
In this paper we explore private computation built on vector addition and its applications in privacypreserving data mining. Vector addition is a surprisingly general tool for imp...
AI
2008
Springer
13 years 8 months ago
2008
Springer
Representing and reasoning about time dependent information is a key research issue in many areas of computer science and artificial intelligence. One of the best known and widely...
CDC
2009
IEEE
14 years 25 days ago
2009
IEEE
— In this paper we use partially ordered sets (posets) to study decentralized control problems arising in different settings. We show that time delayed systems with certain dela...
TSMC
2008
13 years 8 months ago
2008
This paper proposes a novel method to estimate the head yaw rotations based on the asymmetry of 2-D facial appearance. In traditional appearance-based pose estimation methods, feat...