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DAC
2000
ACM
14 years 1 months ago
2000
ACM
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
ISCA
1998
IEEE
14 years 1 months ago
1998
IEEE
Computer systems have become powerful enough to process continuous data streams such as video or animated graphics. While processing power and communication bandwidth of today...
DAC
1994
ACM
14 years 1 months ago
1994
ACM
Today's high-performance single-chip CMOS microprocessors are the most complex and challenging chip designs ever implemented. To stay on the leading edge, Digital's micro...
FROCOS
2000
Springer
14 years 17 days ago
2000
Springer
The behaviour of many systems is naturally modelled by a set of ordinary differential equations (ODEs) which are parametric. Since decisions are often based on relations over these...
ISPE
2003
13 years 10 months ago
2003
A two stage approach to co-ordination in a multi-agent society is presented. The first stage involves agents learning to co-ordinate their activities based on local and global uti...