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ASPDAC
2010
ACM
13 years 8 months ago
2010
ACM
As Double Patterning Lithography(DPL) becomes the leading candidate for sub-30nm lithography process, we need a fast and lithography friendly decomposition framework. In this pape...
ICIP
2010
IEEE
13 years 8 months ago
2010
IEEE
We present a novel approach to HDR (high-dynamic-range) image fusion that copes with image blur degradation often present in longexposed images. The proposed approach can deal wit...
TOG
2010
13 years 4 months ago
2010
The modeling of volumetric objects is still a difficult problem. Solid texture synthesis methods enable the design of volumes with homogeneous textures, but global features such a...
TVLSI
2010
13 years 4 months ago
2010
By storing more than one bit in each memory cell, multi-level per cell (MLC) NAND flash memories are dominating global flash memory market due to their appealing storage density ad...
ASPLOS
2011
ACM
13 years 1 months ago
2011
ACM
New storage-class memory (SCM) technologies, such as phasechange memory, STT-RAM, and memristors, promise user-level access to non-volatile storage through regular memory instruct...