—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
An object diagram makes explicit the object structures that are only implicit in a class diagram. An object diagram may be missing and must extracted from the code. Alternatively,...
The ICP (Iterative Closest Point) algorithm is the de facto standard for geometric alignment of threedimensional models when an initial relative pose estimate is available. The ba...
The widespread presence of SIMD devices in today’s microprocessors has made compiler techniques for these devices tremendously important. One of the most important and difficul...
Conventional approaches to image retrieval are based on the assumption that relevant images are physically near the query image in some feature space. This is the basis of the clu...