1184 search results - page 162 / 237 » Nearness relations and topology |
ISQED
2010
IEEE
14 years 3 months ago
2010
IEEE
—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
OOPSLA
2009
Springer
14 years 3 months ago
2009
Springer
An object diagram makes explicit the object structures that are only implicit in a class diagram. An object diagram may be missing and must extracted from the code. Alternatively,...
3DIM
2007
IEEE
14 years 3 months ago
2007
IEEE
The ICP (Iterative Closest Point) algorithm is the de facto standard for geometric alignment of threedimensional models when an initial relative pose estimate is available. The ba...
PLDI
2006
ACM
14 years 2 months ago
2006
ACM
The widespread presence of SIMD devices in today’s microprocessors has made compiler techniques for these devices tremendously important. One of the most important and difficul...
MMDB
2003
ACM
14 years 2 months ago
2003
ACM
Conventional approaches to image retrieval are based on the assumption that relevant images are physically near the query image in some feature space. This is the basis of the clu...