Optical lithography is a critical step in the semiconductor manufacturing process, and one key problem is the design of the photomask for a particular circuit pattern, given the o...
Rendering photorealistic virtual objects from their real images is one of the main research issues in mixed reality systems. We previously proposed the Eigen-Texture method, a new...
At Leiden University, we are developing a design methodology that allows for fast mapping of nested-loop applications (e.g. DSP, Imaging, or MultiMedia) written in a subset of Matl...
Claudiu Zissulescu, Bart Kienhuis, Ed F. Depretter...
In this paper, a multiobjective (MO) learning approach to image feature extraction is described, where Pareto-optimal interest point (IP) detectors are synthesized using genetic p...
— As technology scales, the delay uncertainty caused by process variations has become increasingly pronounced in deep submicron designs. In the presence of process variations, wo...