The main objectives of Built-In Self Test (BIST) are the design of test pattern generator circuits which achieve the highest fault coverage, require the shortest sequence of test ...
Double patterning lithography seems to be a prominent choice for 32nm and 22nm technologies. Double patterning lithography techniques require additional masks for a single interco...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
In this paper, we originally propose a multiscale feature extraction method of finger-vein patterns based on curvelets and local interconnection structure neural networks. The cur...
For the proper design of energy-efficient error control schemes some insight into channel error patterns is needed. This paper presents bit error and packet loss measurements taken...
In this paper, we analyze impedance matching concepts in passive radio frequency identification (RFID) transponders, which are powered by the incoming RF energy and consist of an...