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VL
2002
IEEE
155views Visual Languages» more  VL 2002»
14 years 1 months ago
Virtual Reality Interaction: The Characteristic Pattern Approach
We merge the Pictorial Computing Laboratory (PCL) approach to WIMP interaction with the Interaction Locus approach to structuring visual spaces as a step toward the definition of ...
Augusto Celentano, Daniela Fogli, Piero Mussio, Fa...
ICSE
2003
IEEE-ACM
14 years 9 months ago
Patterns, Frameworks, and Middleware: Their Synergistic Relationships
The knowledge required to develop complex software has historically existed in programming folklore, the heads of experienced developers, or buried deep in the code. These locatio...
Douglas C. Schmidt, Frank Buschmann
JSS
2011
126views more  JSS 2011»
12 years 11 months ago
A novel statistical time-series pattern based interval forecasting strategy for activity durations in workflow systems
Forecasting workflow activity durations is of great importance to support satisfactory QoS in workflow systems. Traditionally, a workflow system is often designed to facilitate the...
Xiao Liu, Zhiwei Ni, Dong Yuan, Yuan-Chun Jiang, Z...
ICMI
2003
Springer
128views Biometrics» more  ICMI 2003»
14 years 2 months ago
Modeling multimodal integration patterns and performance in seniors: toward adaptive processing of individual differences
Multimodal interfaces are designed with a focus on flexibility, although very few currently are capable of adapting to major sources of user, task, or environmental variation. The...
Benfang Xiao, Rebecca Lunsford, Rachel Coulston, R...
ICCAD
2009
IEEE
151views Hardware» more  ICCAD 2009»
13 years 6 months ago
Timing yield-aware color reassignment and detailed placement perturbation for double patterning lithography
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
Mohit Gupta, Kwangok Jeong, Andrew B. Kahng