12 search results - page 3 / 3 » One-Shot Optimal Exposure Control |
ISQED
2010
IEEE
14 years 2 months ago
2010
IEEE
—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
CCS
2003
ACM
14 years 21 days ago
2003
ACM
We propose a new notion of cryptographic tamper evidence. A tamper-evident signature scheme provides an additional procedure Div which detects tampering: given two signatures, Div...