Many statistical M-estimators are based on convex optimization problems formed by the weighted sum of a loss function with a norm-based regularizer. We analyze the convergence rat...
Alekh Agarwal, Sahand Negahban, Martin J. Wainwrig...
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
The ever increasing sizes of on-chip caches and the growing domination of wire delay necessitate significant changes to cache hierarchy design methodologies. Many recent proposal...
We present a catadioptric projector analogous to a catadioptric camera by combining a commodity digital projector with additional optical units. We show that, by using specially sh...
With the scaling of technology and higher requirements on performance and functionality, power dissipation is becoming one of the major design considerations in the development of...
Jia Yu, Wei Wu, Xi Chen, Harry Hsieh, Jun Yang 000...