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SLIP
2009
ACM
14 years 2 months ago
Is overlay error more important than interconnect variations in double patterning?
Double patterning lithography seems to be a prominent choice for 32nm and 22nm technologies. Double patterning lithography techniques require additional masks for a single interco...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
DATE
2003
IEEE
93views Hardware» more  DATE 2003»
14 years 27 days ago
Comparison of Test Pattern Decompression Techniques
Test pattern decompression techniques are bounded with the algorithm of test pattern ordering and test data flow controlling. Some of the methods could have more sophisticated sor...
Ondrej Novák
AINA
2010
IEEE
14 years 14 days ago
The Cost Effective Pre-processing Based NFA Pattern Matching Architecture for NIDS
—Network Intrusion Detection System (NIDS) is a system which can detect network attacks resulted from worms and viruses on the Internet. An efficient pattern matching algorithm p...
Yeim-Kuan Chang, Chen-Rong Chang, Cheng-Chien Su
ITC
1995
IEEE
104views Hardware» more  ITC 1995»
13 years 11 months ago
Synthesis of Mapping Logic for Generating Transformed Pseudo-Random Patterns for BIST
During built-in self-test (BIST), the set of patterns generated by a pseudo-random pattern generator may not provide a sufficiently high fault coverage. This paper presents a new ...
Nur A. Touba, Edward J. McCluskey
CASES
2009
ACM
14 years 9 days ago
Complete nanowire crossbar framework optimized for the multi-spacer patterning technique
Nanowire crossbar circuits are an emerging architectural paradigm that promises a higher integration density and an improved fault-tolerance due to its reconfigurability. In this...
M. Haykel Ben Jamaa, Gianfranco Cerofolini, Yusuf ...