Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
Abstract—In this paper we ask which properties of a distributed network can be computed from a few amount of local information provided by its nodes. The distributed model we con...
An algorithm is presented for the geometric analysis of an algebraic curve f(x, y) = 0 in the real affine plane. It computes a cylindrical algebraic decomposition (CAD) of the pla...