Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
This paper is focused on how a general-purpose hierarchical planning representation, based on the HTN paradigm, can be used to support the representation of oncology treatment pro...
In this paper we make a comparative study of several mixed integer linear programming (MILP) formulations for resource-constrained project scheduling problems (RCPSPs). First, we ...
Polynomial identity testing (PIT) problem is known to be challenging even for constant depth arithmetic circuits. In this work, we study the complexity of two special but natural ...
This paper presents a novel method for online and incremental appearance-based localization and mapping in a highly dynamic environment. Using position-invariant robust features (...