—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
Background: In recent years, a considerable amount of research effort has been directed to the analysis of biological networks with the availability of genome-scale networks of ge...
A review of research that has been carried out on data mining and visual analysis of movement patterns suggests that there is little agreement on the relevant types of movement pa...
Somayeh Dodge, Robert Weibel, Anna-Katharina Laute...
Unsupervised sequence learning is important to many applications. A learner is presented with unlabeled sequential data, and must discover sequential patterns that characterize th...
The existing Multi-View Learning (MVL) learns how to process patterns with multiple information sources. In generalization this MVL is proven to have a significant advantage over...