—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
Abstract. This paper presents a framework for the reuse and extension of existing, established vocabularies in the Semantic Web. Driven by the primary application of expert findin...
Boanerges Aleman-Meza, Uldis Bojars, Harold Boley,...
Online multi-participant virtual-world systems have attracted significant interest from the Internet community but are hindered by their inability to efficiently support interacti...