Many techniques for power management employed in advanced RTL synthesis tools rely explicitly or implicitly on observability don’t-care (ODC) conditions. In this paper we presen...
Double patterning lithography seems to be a prominent choice for 32nm and 22nm technologies. Double patterning lithography techniques require additional masks for a single interco...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
Adaptive Body Biasing (ABB) is a popularly used technique to mitigate the increasing impact of manufacturing process variations on leakage power dissipation. The efficacy of the ...
With technology advances, the number of cores integrated on a chip and their speed of operation is increasing. This, in turn is leading to a significant increase in chip temperat...
Srinivasan Murali, Almir Mutapcic, David Atienza, ...
—Increasing integrated circuit (IC) power densities and temperatures may hamper multiprocessor system-on-chip (MPSoC) use in hard real-time systems. This article formalizes the t...
Thidapat Chantem, Robert P. Dick, Xiaobo Sharon Hu