This paper describes how to automatically extract the presence and location of geometrical irregularities on a surface of revolution. To this end a partial 3D scan of the workpiec...
Kasper Claes, Thomas P. Koninckx, Herman Bruyninck...
—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
Background: The evaluation of statistical significance has become a critical process in identifying differentially expressed genes in microarray studies. Classical p-value adjustm...
Nitin Jain, HyungJun Cho, Michael O'Connell, Jae K...
Supply chains are ubiquitous in the manufacturing of many complex products. Traditionally, supply chains have been created through the intricate interactions of human representati...
Background: The development of effective frameworks that permit an accurate diagnosis of tumors, especially in their early stages, remains a grand challenge in the field of bioinf...
Andreas Keller, Nicole Ludwig, Nicole Comtesse, An...