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ICCAD
2008
IEEE
14 years 4 months ago
2008
IEEE
— As Double Patterning Technology (DPT) becomes the only solution for 32-nm lithography process, we need to investigate how DPT affects the performance of a chip. In this paper, ...
ICCAD
2008
IEEE
14 years 2 months ago
2008
IEEE
— As technology scales to 45nm and below, process variations will present significant impact on path delay. This trend makes the deviation between simulated path delay and actua...
ICCAD
2008
IEEE
14 years 4 months ago
2008
IEEE
- In this paper, we present a technique to optimize the energy-delay product of a synchronous linear pipeline circuit with dynamic error detection and correction capability running...
ICCAD
2008
IEEE
14 years 4 months ago
2008
IEEE
– Due to reduction in device feature size and supply voltage, the sensitivity of digital systems to transient faults is increasing dramatically. As technology scales further, the...
ICCAD
2008
IEEE
14 years 4 months ago
2008
IEEE
Abstract—On-chip power density and temperature are rising exponentially with decreasing feature sizes. This alarming trend calls for temperature management at every level of syst...