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    2006
    ACM
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    Process variation aware OPC with variational lithography modeling
    15 years 7 months ago
    Process variation aware OPC with variational lithography modeling
    Download  www.cerc.utexas.edu
    Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional ...
    Peng Yu, Sean X. Shi, David Z. Pan
    claim paper
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