Sciweavers

DAC
2004
ACM
15 years 14 days ago
Toward a methodology for manufacturability-driven design rule exploration
Resolution enhancement techniques (RET) such as optical proximity correction (OPC) and phase-shift mask (PSM) technology are deployed in modern processes to increase the fidelity ...
Luigi Capodieci, Puneet Gupta, Andrew B. Kahng, De...