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38

ICCAD
2010
IEEE

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WISDOM: Wire spreading enhanced decomposition of masks in Double Patterning Lithography

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WISDOM: Wire spreading enhanced decomposition of masks in Double Patterning Lithography

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In Double Patterning Lithography (DPL), conflict and stitch minimization are two main challenges. Post-routing mask decomposition algorithms [1

Kun Yuan, David Z. Pan

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Double Patterning Lithography | Hardware | ICCAD 2010 | Mask Decomposition | Wire Spreading |

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Added	11 Feb 2011
Updated	11 Feb 2011
Type	Journal
Year	2010
Where	ICCAD
Authors	Kun Yuan, David Z. Pan

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