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SOCC
2008
IEEE

Low power 8T SRAM using 32nm independent gate FinFET technology

14 years 6 months ago
Low power 8T SRAM using 32nm independent gate FinFET technology
In this paper, new SRAM cell design methods for FinFET technology are proposed. One of the most important features of FinFET is that the independent front and back gate can be biased differently to control the current and the device threshold voltage. By controlling the back gate of FinFET, SRAM cell can be designed for minimum power consumption. This paper proposes a new 8T (8 transistors) SRAM structure that reduces dynamic power in writing operation and provides wider SNM (Static Noise Margin). Using the new FinFET based 8T SRAM cell, dynamic power consumption is reduced about 48% and the SNM is widened up to 56% compared to the conventional 6T SRAM at the expense of 2% leakage power and 3% write delay increase.
Young Bok Kim, Yong-Bin Kim, Fabrizio Lombardi
Added 01 Jun 2010
Updated 01 Jun 2010
Type Conference
Year 2008
Where SOCC
Authors Young Bok Kim, Yong-Bin Kim, Fabrizio Lombardi
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