This paper describes features and methods for document image comparison and classification at the spatial layout level. The methods are useful for visual similarity based document...
Jianying Hu, Ramanujan S. Kashi, Gordon T. Wilfong
We present a 3-D version of GEM [6], a randomized adaptive layout algorithm for nicely drawing undirected graphs, based on the spring-embedder paradigm [4]. The new version, GEM-3D...
As Double Patterning Lithography(DPL) becomes the leading candidate for sub-30nm lithography process, we need a fast and lithography friendly decomposition framework. In this pape...
Jae-Seok Yang, Katrina Lu, Minsik Cho, Kun Yuan, D...
Chemical-mechanical polishing (CMP) and other manufacturing steps in very deep submicron VLSI have varying effects on device and interconnect features, depending on local character...
Yu Chen, Andrew B. Kahng, Gabriel Robins, Alexande...