60 search results - page 1 / 12 » A one-shot projection method for interconnects with process ... |
ISCAS
2006
IEEE
14 years 29 days ago
2006
IEEE
—With the development of IC technology, it becomes urgent to investigate model reduction method for interconnects with process variations. In this paper, a one-shot projection al...
GLVLSI
2006
IEEE
14 years 1 months ago
2006
IEEE
Process variations have become a serious concern for nanometer technologies. The interconnect and device variations include interand intra-die variations of geometries, as well as...
SLIP
2009
ACM
14 years 1 months ago
2009
ACM
In this paper, a comprehensive and fast method is presented for the timing analysis of process variations on single-walled carbon nanotube (SWCNT) bundles. Unlike previous works t...
ASPDAC
2007
ACM
13 years 11 months ago
2007
ACM
As process technology continues to scale into the nanoscale regime, interconnect plays an ever increasing role in determining VLSI system performance. As the complexity of these sy...
ISQED
2003
IEEE
14 years 7 days ago
2003
IEEE
With continuing scaling of CMOS process, process variations in the form of die-to-die and within-die variations become significant which cause timing uncertainty. This paper prop...