In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different exposures)...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
Technology mapping based on DAG-covering suffers from the problem of structural bias: the structure of the mapped netlist depends strongly on the subject graph. In this paper we ...
Satrajit Chatterjee, Alan Mishchenko, Robert K. Br...
Multiport memories are extensively used in modern system designs because of the performance advantages they offer. The increased memory access throughput could lead to significan...
In this paper, we deal with a generative model for multi-label, interactive segmentation. To estimate the pixel likelihoods for each label, we propose a new higher-order formulatio...
Tae Hoon Kim (Seoul National University), Kyoung M...
We address a version of the set-cover problem where we do not know the sets initially (and hence referred to as covert) but we can query an element to find out which sets contain ...